Sputtering ion pump principle and structure diagram

Sputtering ion pump is mainly based on Penning discharge principle of the vacuum pump, it is nowadays access to oil-free vacuum pump equipment, which can be controlled thermostat nuclear reactor, space environment simulation, vacuum industry, etc. Vacuum pump equipment, so its application is more extensive. Understand its working principle for the use and promotion of products of great significance. Sputtering Ion Pumps In the early part of this century, some people in the vacuum tube evaporate some of the more chemically active metals, but the tube can not be pumped out of the gas can react with the result of reducing the space gas concentration. This metal and the material that plays the same role we call them getters. Capture gas molecules can also use the method of ionization adsorption. Using high-speed electron bombardment gas molecules can be positive ions, positive ions are driven to the negative electrode under the action of an electric field, after neutralization due to intermolecular van der Waals forces are metal adsorption and no longer leave the electrode. This reduces the concentration of space gas molecules, to achieve the purpose of obtaining a vacuum. This phenomenon is called electrical removal, the use of electrical removal to achieve the purpose of purging the pump called the ion pump. Ion pumps are not selective for adsorbed gases. Both ion and sublimation pumps achieve a high degree of vacuum, but using them individually for greater vacuum can be difficult. This has a great relationship with their working mechanism. The capacity of ion pump to capture gas molecules by physical adsorption is limited. Although the chemical bond energy produced by sublimation pump is large, it is easy to saturate on its surface and affect its further absorption of gas, and the sublimation pump has poor adsorption effect on inert gas. Therefore, the two pumps into one, you can get a better aspiration sputtering ion pump. With the continuous development of vacuum pump in our country, sputtering ion pump is widely used today as a vacuum pump, the challenges it faces are very much. The further optimization and improvement of the working principle of the Sputtering Ion Pump will play a very important role in the development of this product afterwards. The relevant professionals should pay more attention to this information. In the age of science and technology, each product will lose its competitiveness if it does not conduct continuous research and innovation. Related Articles: Principles and structure of getter ion pump Diffusion pump working principle and structure diagram

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